We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Drawing device.
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Drawing device Product List and Ranking from 9 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

Drawing device Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

  1. ハイデルベルグ・インストルメンツ Kanagawa//Optical Instruments
  2. SCREEN PEソリューションズ 本社 Kyoto//Industrial Electrical Equipment
  3. 伯東 本社 Tokyo//Electronic Components and Semiconductors
  4. 日本カンタム・デザイン Tokyo//Testing, Analysis and Measurement
  5. 5 トライテック Niigata//Other manufacturing
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Drawing device Product ranking

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

  1. Laser drawing device "DWL 2000 GS" series ハイデルベルグ・インストルメンツ
  2. Laser Direct Writing Device "DWL 66+" ハイデルベルグ・インストルメンツ
  3. Direct Drawing Device "Ledia6" SCREEN PEソリューションズ 本社
  4. 4 Electron beam drawing device 伯東 本社
  5. 4 High-speed laser drawing device "VPG⁺ Series" ハイデルベルグ・インストルメンツ

Drawing device Product List

1～15 item / All 16 items

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Compact LED Direct Drawing Device "Micro Writer ML Family"

Compact LED Direct Drawing Device "Micro Writer ML Family"

Compact tabletop! A maskless LED direct drawing device that enables high-speed pattern prototyping.

The "Micro Writer ML Family" from Japan Quantum Design is a compact, desktop LED direct drawing device that enables high-speed pattern prototyping without the need for masks. It allows for quick prototyping of small patterns without the hassle of creating masks each time a pattern is made. It is capable of directly drawing on photoresist using LEDs. 【Features】 ■ Compact desktop size (base area 70cm x 60cm) ■ Enables high-speed pattern prototyping ■ Eliminates the need for mask creation each time ■ Capable of direct LED drawing on photoresist *For more details, please refer to the PDF materials or feel free to contact us.

  • Other processing machines
  • Other semiconductor manufacturing equipment

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Inkjet Coating Drawing Device "DevicePrinter Series"

Inkjet Coating Drawing Device "DevicePrinter Series"

Evolving from a mere painting or drawing device to a device that can actually create objects.

Complex processes can be performed on a single device.

  • Printing Machinery

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Inkjet High-Precision Drawing Device 'PatterningJET'

Inkjet High-Precision Drawing Device 'PatterningJET'

Industrial inkjet system aimed at material development and device development! Equipped with multiple heads, it allows for the application of different materials!

"PatterningJET" can be utilized for electronics applications that require high-precision drawing (patterning) on wafers and glass substrates. It is an effective device for material development, device development, substrate development, color filter applications, and more. 【Features】 ■ Equipped with multiple heads, allowing for the application of different materials ■ High-precision overlay drawing at the micron level possible when combined with alignment functions ■ High positioning accuracy achieved with a high-precision XY table ■ Various head drive conditions can be adjusted (voltage, pulse, frequency, temperature, etc.) ■ Each drawing condition can be set (high-quality printing, unidirectional/reverse, drawing speed) *For more details, please request materials or view the PDF data available for download.

  • Commercial printers

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Laser Direct Writing Device "DWL 66+"

Laser Direct Writing Device "DWL 66+"

High-performance laser lithography equipment for research and development.

The "DWL 66+" is a high-resolution laser direct writing system suitable for research and development applications, small lot production, mask creation, and maskless exposure. It is equipped with the necessary functions for the fabrication and analysis of microstructures as a standard system. With high processing capability and a wide range of applications, it contributes to research and development in applications requiring microstructure fabrication, such as MEMS and micro-optics. 【Features】 ■ For maskless exposure and mask creation ■ 2.5D grayscale exposure mode (standard 128 levels, optional 255 levels or 1000 levels) ■ Versatile with rich features and expandability for multiple applications ■ Switchable up to six drawing modes (0.3um-4.0um) (pixel size) ■ High-precision alignment with backside alignment capability ■ Maximum substrate size supported is 9 inches x 9 inches ■ Compatible with various data formats *For more details, please refer to the catalog or feel free to contact us.

  • Electron beam lithography equipment
  • Other semiconductor manufacturing equipment
  • Stepper

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"ULTRA" series of mask laser drawing devices for semiconductors.

"ULTRA" series of mask laser drawing devices for semiconductors.

High-speed semiconductor mask laser drawing device 'ULTRA'

"ULTRA" is a high-speed, high-resolution laser drawing device suitable for semiconductor mask creation. The "ULTRA" is a cost-effective mask drawing device equipped with high productivity, high precision, high uniformity, and ultra-high precision alignment accuracy.

  • Electron beam lithography equipment
  • Photomask
  • Stepper

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Electron beam drawing device

Electron beam drawing device

We offer a lineup of electron beam lithography systems, ranging from high-precision types with an acceleration voltage of 100 kV to universal types with SEM functionality, capable of meeting various needs.

The EBPG series from Raith is a high-speed, high-precision electron beam lithography system designed for small-scale production, with over 130 units delivered worldwide. Features of EBPG: ● Maximum current of 350 nA, achieving the fastest throughput in the industry ● High-precision drawing possible with overlay below 5 nm and stitching below 8 nm ● Automatic aperture change during drawing according to pattern size, reducing drawing time ● Maximum substrate size of 8 inches ● Auto airlock for mass production (up to 10 holders) Lineup of electron beam lithography systems for research and development: ● Pioneer Two (EBL-SEM hybrid) supports up to 50mm x 50mm ● eLINE Plus supports up to 4 inches ● Raith150 Two supports up to 8 inches ● Voyager (with mini engine) supports up to 8 inches

  • Electron beam lithography equipment
  • Other surface treatment equipment

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Laser drawing device

Laser drawing device

Industry high-level high-resolution or high-throughput maskless laser direct writing equipment

Raith is known as a company that provides advanced technology in the field of nanofabrication, developing and designing cutting-edge tools including FIB-SEM and maskless EB direct writing systems. The company has a product lineup particularly suitable for fine pattern formation and nanoscale structure creation, which is utilized by a wide range of research institutions and industries. In 2021, it further expanded its product portfolio by acquiring 4PICO litho, a company that developed and manufactured maskless laser direct writing systems. Raith's tools support not only patterning on various substrates but also 3D structuring, boasting over 1,200 units delivered worldwide.

  • Electron beam lithography equipment
  • Other surface treatment equipment

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Inkjet High-Precision Drawing Device 'OnePass JET'

Inkjet High-Precision Drawing Device 'OnePass JET'

High-speed printing is possible with linear motor drive! A simulation experimental machine for single-pass printing.

The "OnePass JET" is an experimental machine designed for simulating single-pass printing. It features high-speed printing with a linear motor drive and a maximum transport speed of 2.5 m/sec. The fixed head system allows for the movement of an A4-sized table. It can be utilized for ink evaluation and media evaluation. 【Features】 ■ Single-pass multi-band printing ■ Simulation of wide printing with multiple heads ■ Linear motor drive ■ High-speed movement with a maximum transport speed of 2.5 m/sec ■ Usable for ink evaluation and media evaluation *For more details, please refer to the PDF materials or feel free to contact us.

  • Printing Machinery

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Wavelength 285nm hydrophilic treatment pattern drawing device

Wavelength 285nm hydrophilic treatment pattern drawing device

This is a pattern drawing device essential for inkjet printing in printed electronics applications, featuring hydrophilic and hydrophobic areas. Wavelength 285 nm.

1) Photon energy that can break molecular bonding energy of organic substances. It draws hydrophilic areas on surfaces such as polyimide films. 2) Guides inkjet ink onto patterns and improves bulges, etc. - Inexpensive optical system using 285nm high-power UV LED - Pattern width: 200μm - Drawing area: 100×100mm - DXF file format can be used

  • Other semiconductor manufacturing equipment

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Laser drawing device "DWL 2000 GS" series

Laser drawing device "DWL 2000 GS" series

High-speed high-resolution laser exposure device

The "DWL 2000 GS" is a flexible, high-speed, high-resolution laser drawing device suitable for grayscale lithography. Grayscale lithography is a technique that reproduces slope patterns, such as microlenses and blazed diffraction gratings, on a resist, differing from traditional binary lithography. The "DWL 2000 GS" series has a maximum drawing area of 200x200 mm² or 400x400 mm², enabling high-speed, high-precision patterning on masks and wafers for applications requiring MEMS, BioMEMS, Micro-Optics, ASIC, Micro Fluidics, sensors, holograms, and other fine structures. To enhance surface roughness accuracy in grayscale lithography applications, it supports 1000 levels of grayscale. 【Features】 ■ High stability and high-speed, high-resolution exposure ■ Up to five selectable drawing modes ■ High-precision alignment camera system ■ Grayscale drawing mode *For more details, please refer to the catalog or feel free to contact us.

  • Electron beam lithography equipment
  • Other semiconductor manufacturing equipment
  • Stepper

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High-speed laser drawing device "VPG⁺ Series"

High-speed laser drawing device "VPG⁺ Series"

High-speed pattern generator

The "VPG+ Series" is a high-speed exposure system that can accommodate large mask manufacturing, resist master creation, and direct drawing on various flat substrates due to its fast exposure speed. It can be utilized in fields that require semiconductors, displays, sensors, MEMS, advanced packaging, LED production, life sciences, and microfabrication. 【Features】 ■ High resolution ■ High image quality ■ High throughput ■ Ideal for high-speed photomask production ■ Capable of direct drawing on any flat substrate *For more details, please refer to the catalog or feel free to contact us.

  • Electron beam lithography equipment
  • Other semiconductor manufacturing equipment
  • Stepper

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VPG 300 DI

VPG 300 DI

A high-speed drawing device compatible with 300x300mm square substrates has been added to the VPG series.

- High precision and high-speed rendering - Maximum drawing area 300x300mm²

  • Other semiconductor manufacturing equipment

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Direct Drawing Device "Ledia6"

Direct Drawing Device "Ledia6"

Freely control three wavelengths, enabling direct imaging in the optimal wavelength range.

The "Ledia6" is a direct drawing device that continues to respond to the needs for further high density and high precision of substrates mounted on mobile devices, as well as a wide variety of substrates for automotive electronics, with reliable exposure technology. By freely controlling a three-wavelength light source, it can cover a broader wavelength range necessary for exposure, significantly expanding the types of compatible resists. Additionally, it is equipped with a unique alignment algorithm that corrects substrate distortion, achieving high precision finishing and the highest level of throughput unique to direct drawing devices. 【Features】 ■ UV-LED multi-wavelength exposure ■ Achieves high-quality exposure regardless of the type of resist ■ High-speed alignment ■ Drawing quality suitable for high value-added fields ■ System configuration that can be selected from mass production to prototyping and small lots *For more details, please download the PDF or feel free to contact us.

  • Electron beam lithography equipment

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Current stability and position stability are top-class in the industry! Electron beam lithography equipment.

Current stability and position stability are top-class in the industry! Electron beam lithography equipment.

Achieved a minimum beam diameter of 2nm at an acceleration voltage of 50kV! *Drawing demo available.

This is a model suitable for the production of DFB-LDs (Distributed Feedback Laser Diodes) for communication use. It is a flagship product that adopts a 50kV acceleration voltage, balancing fine processing capability and resist sensitivity. 【Features】 ■ TFE electron gun using single crystal ZrO/W ■ Outstanding beam current stability and beam position stability ■ Achieves a minimum beam diameter of 2nm at an acceleration voltage of 50kV *Drawing demonstrations are available. For more details, please contact us or download the PDF for more information.

  • Electron beam lithography equipment

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Electron Beam Drawing Device 'CABL-UH'

Electron Beam Drawing Device 'CABL-UH'

A new structure of the telescope tube has been developed that hardly generates any micro-discharges, achieving stable operation for extended periods.

The "CABL-UH" is an electron beam lithography system that enables finer processing due to reduced forward scattering of electrons within the resist, achieved by adopting a high acceleration voltage. The 130kV acceleration voltage is generated through a single-stage acceleration, resulting in a shorter structure compared to conventional multi-stage accelerated electron guns. This single-stage acceleration design has realized an electron optical system with low aberration and minimal Coulomb blur. Additionally, we offer a lineup of 110kV and 90kV options to suit our customers' applications and budgets. Please feel free to contact us. 【Features】 ■ Adoption of high acceleration voltage ■ Reduced forward scattering of electrons within the resist ■ Capability for finer processing ■ High-resolution drawing possible with high current * You can download the English catalog. * For more details, please refer to the PDF materials or feel free to contact us.

  • Other processing machines

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