Inkjet Coating Drawing Device "DevicePrinter Series"
Evolving from a mere painting or drawing device to a device that can actually create objects.
Complex processes can be performed on a single device.
- Company：マイクロジェット
- Price：Other
Drawing device Product List and Ranking from 6 Manufacturers, Suppliers and Companies
Last Updated： Aggregation Period:Jul 23, 2025～Aug 19, 2025
This ranking is based on the number of page views on our site.
Drawing device Manufacturer, Suppliers and Company Rankings
Last Updated： Aggregation Period:Jul 23, 2025～Aug 19, 2025
This ranking is based on the number of page views on our site.
- ハイデルベルグ・インストルメンツ Kanagawa//Optical Instruments
- null/null
- SCREEN PEソリューションズ Kyoto//Industrial Electrical Equipment 本社
- 4 FFGSグラフィックサプライ Tokyo//Printing Industry
- 4 null/null
Drawing device Product ranking
Last Updated： Aggregation Period:Jul 23, 2025～Aug 19, 2025
This ranking is based on the number of page views on our site.
- Laser drawing device "DWL 2000 GS" series ハイデルベルグ・インストルメンツ
- Laser Direct Writing Device "DWL 66+" ハイデルベルグ・インストルメンツ
- Laser drawing device
- 4 Electron beam drawing device
- 4 Direct Drawing Device "Ledia6" SCREEN PEソリューションズ 本社
Drawing device Product List
1～15 item / All 16 items
Displayed results
Inkjet High-Precision Drawing Device 'PatterningJET'
Industrial inkjet system aimed at material development and device development! Equipped with multiple heads, it allows for the application of different materials!
"PatterningJET" can be utilized for electronics applications that require high-precision drawing (patterning) on wafers and glass substrates. It is an effective device for material development, device development, substrate development, color filter applications, and more. 【Features】 ■ Equipped with multiple heads, allowing for the application of different materials ■ High-precision overlay drawing at the micron level possible when combined with alignment functions ■ High positioning accuracy achieved with a high-precision XY table ■ Various head drive conditions can be adjusted (voltage, pulse, frequency, temperature, etc.) ■ Each drawing condition can be set (high-quality printing, unidirectional/reverse, drawing speed) *For more details, please request materials or view the PDF data available for download.
- Company：トライテック
- Price：Other
Laser Direct Writing Device "DWL 66+"
High-performance laser lithography equipment for research and development.
The "DWL 66+" is a high-resolution laser direct writing system suitable for research and development applications, small lot production, mask creation, and maskless exposure. It is equipped with the necessary functions for the fabrication and analysis of microstructures as a standard system. With high processing capability and a wide range of applications, it contributes to research and development in applications requiring microstructure fabrication, such as MEMS and micro-optics. 【Features】 ■ For maskless exposure and mask creation ■ 2.5D grayscale exposure mode (standard 128 levels, optional 255 levels or 1000 levels) ■ Versatile with rich features and expandability for multiple applications ■ Switchable up to six drawing modes (0.3um-4.0um) (pixel size) ■ High-precision alignment with backside alignment capability ■ Maximum substrate size supported is 9 inches x 9 inches ■ Compatible with various data formats *For more details, please refer to the catalog or feel free to contact us.
- Company：ハイデルベルグ・インストルメンツ
- Price：50 million yen-100 million yen
"ULTRA" series of mask laser drawing devices for semiconductors.
High-speed semiconductor mask laser drawing device 'ULTRA'
"ULTRA" is a high-speed, high-resolution laser drawing device suitable for semiconductor mask creation. The "ULTRA" is a cost-effective mask drawing device equipped with high productivity, high precision, high uniformity, and ultra-high precision alignment accuracy.
- Company：ハイデルベルグ・インストルメンツ
- Price：Other
Inkjet High-Precision Drawing Device 'OnePass JET'
High-speed printing is possible with linear motor drive! A simulation experimental machine for single-pass printing.
The "OnePass JET" is an experimental machine designed for simulating single-pass printing. It features high-speed printing with a linear motor drive and a maximum transport speed of 2.5 m/sec. The fixed head system allows for the movement of an A4-sized table. It can be utilized for ink evaluation and media evaluation. 【Features】 ■ Single-pass multi-band printing ■ Simulation of wide printing with multiple heads ■ Linear motor drive ■ High-speed movement with a maximum transport speed of 2.5 m/sec ■ Usable for ink evaluation and media evaluation *For more details, please refer to the PDF materials or feel free to contact us.
- Company：トライテック
- Price：Other
Laser drawing device "DWL 2000 GS" series
High-speed high-resolution laser exposure device
The "DWL 2000 GS" is a flexible, high-speed, high-resolution laser drawing device suitable for grayscale lithography. Grayscale lithography is a technique that reproduces slope patterns, such as microlenses and blazed diffraction gratings, on a resist, differing from traditional binary lithography. The "DWL 2000 GS" series has a maximum drawing area of 200x200 mm² or 400x400 mm², enabling high-speed, high-precision patterning on masks and wafers for applications requiring MEMS, BioMEMS, Micro-Optics, ASIC, Micro Fluidics, sensors, holograms, and other fine structures. To enhance surface roughness accuracy in grayscale lithography applications, it supports 1000 levels of grayscale. 【Features】 ■ High stability and high-speed, high-resolution exposure ■ Up to five selectable drawing modes ■ High-precision alignment camera system ■ Grayscale drawing mode *For more details, please refer to the catalog or feel free to contact us.
- Company：ハイデルベルグ・インストルメンツ
- Price：More than 100million yen
High-speed laser drawing device "VPG⁺ Series"
High-speed pattern generator
The "VPG+ Series" is a high-speed exposure system that can accommodate large mask manufacturing, resist master creation, and direct drawing on various flat substrates due to its fast exposure speed. It can be utilized in fields that require semiconductors, displays, sensors, MEMS, advanced packaging, LED production, life sciences, and microfabrication. 【Features】 ■ High resolution ■ High image quality ■ High throughput ■ Ideal for high-speed photomask production ■ Capable of direct drawing on any flat substrate *For more details, please refer to the catalog or feel free to contact us.
- Company：ハイデルベルグ・インストルメンツ
- Price：More than 100million yen
VPG 300 DI
A high-speed drawing device compatible with 300x300mm square substrates has been added to the VPG series.
- High precision and high-speed rendering - Maximum drawing area 300x300mm²
- Company：ハイデルベルグ・インストルメンツ
- Price：More than 100million yen
Direct Drawing Device "Ledia6"
Freely control three wavelengths, enabling direct imaging in the optimal wavelength range.
The "Ledia6" is a direct drawing device that continues to respond to the needs for further high density and high precision of substrates mounted on mobile devices, as well as a wide variety of substrates for automotive electronics, with reliable exposure technology. By freely controlling a three-wavelength light source, it can cover a broader wavelength range necessary for exposure, significantly expanding the types of compatible resists. Additionally, it is equipped with a unique alignment algorithm that corrects substrate distortion, achieving high precision finishing and the highest level of throughput unique to direct drawing devices. 【Features】 ■ UV-LED multi-wavelength exposure ■ Achieves high-quality exposure regardless of the type of resist ■ High-speed alignment ■ Drawing quality suitable for high value-added fields ■ System configuration that can be selected from mass production to prototyping and small lots *For more details, please download the PDF or feel free to contact us.
- Company：SCREEN PEソリューションズ 本社
- Price：Other
Current stability and position stability are top-class in the industry! Electron beam lithography equipment.
Achieved a minimum beam diameter of 2nm at an acceleration voltage of 50kV! *Drawing demo available.
This is a model suitable for the production of DFB-LDs (Distributed Feedback Laser Diodes) for communication use. It is a flagship product that adopts a 50kV acceleration voltage, balancing fine processing capability and resist sensitivity. 【Features】 ■ TFE electron gun using single crystal ZrO/W ■ Outstanding beam current stability and beam position stability ■ Achieves a minimum beam diameter of 2nm at an acceleration voltage of 50kV *Drawing demonstrations are available. For more details, please contact us or download the PDF for more information.
- Company：クレステック 本社
- Price：Other
Electron Beam Drawing Device 'CABL-UH'
A new structure of the telescope tube has been developed that hardly generates any micro-discharges, achieving stable operation for extended periods.
The "CABL-UH" is an electron beam lithography system that enables finer processing due to reduced forward scattering of electrons within the resist, achieved by adopting a high acceleration voltage. The 130kV acceleration voltage is generated through a single-stage acceleration, resulting in a shorter structure compared to conventional multi-stage accelerated electron guns. This single-stage acceleration design has realized an electron optical system with low aberration and minimal Coulomb blur. Additionally, we offer a lineup of 110kV and 90kV options to suit our customers' applications and budgets. Please feel free to contact us. 【Features】 ■ Adoption of high acceleration voltage ■ Reduced forward scattering of electrons within the resist ■ Capability for finer processing ■ High-resolution drawing possible with high current * You can download the English catalog. * For more details, please refer to the PDF materials or feel free to contact us.
- Company：クレステック 本社
- Price：Other
